DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering System with Thickness Monitor

Customization:	Available
After-sales Service:	Yes
Warranty:	One Year

Basic Info

Model NO.

VTC-600-2HD

Structure

Desktop

Material

Stainless Steel

Certification

CE, TUV

Application

Laboratory Lab

DC Source

500W

RF Source

600W

Vacuum Chamber

Stainless Steel

Gas Flow Control

Mass Flow Meter

HS Code

85141090

Production Cap.

120 Sets/Month

Product Description

Dual-Head Magnetron Plasma Sputtering System / Magnetron Sputter Coater

VTC-600-2HD is a compact magnetron sputtering system with dual 2" target sources. It features one DC source for coating metallic film and another RF source for non-metallic materials. Equipped with a film thickness tracker, this system allows for precise control of single or multiple film layers for materials such as alloys, semiconductors, ceramics, and dielectrics.

Input Power	220VAC 50/60Hz, single phase; 2000W (including pump)
Source Power	DC source: 500W (metallic materials); RF source: 600W with auto-matching (non-metallic materials)
Sputtering Head	Two 2" Magnetron Sputtering Heads with water cooling jackets. Fits 2" diameter targets with thickness 0.1 - 5 mm.
Vacuum Chamber	Stainless Steel, 300 mm Dia x 300 mm Height. Includes 100 mm observation window and air spring support cover.
Sample Holder	140mm dia (for 4" wafer max); Rotation speed 1-20 rpm; Temperature adjustable from RT to 500°C.
Vacuum Pump Station	High-speed turbo vacuum pump system (German made) and heavy-duty mechanical pump. Max vacuum: 10^-6 torr.
Thickness Monitor	Built-in precision quartz thickness sensor (0.10 Å accuracy) with LED display unit.

Product Display

Packaging & Workshop

Service & Logistics

• Factory prices with the best quality.
• One year free-of-charge maintenance.
• Customized service for special demands.
• Fast and flexible delivery: Sea, Air, or Express.
• Quick response within 24 hours.

Payment Methods:

Western Union, PayPal, Secure Payment, T/T, L/C

Frequently Asked Questions

What materials can be coated using the VTC-600-2HD?

The system is designed for both metallic materials (using the 500W DC source) and non-metallic materials like ceramics, semiconductors, and dielectrics (using the 600W RF source).

Does the system provide real-time monitoring of coating thickness?

Yes, it includes a precision quartz thickness sensor built into the chamber with a resolution of 0.10 Å and an external LED display unit to monitor thickness and speed.

What is the maximum sample size and heating capability?

The sample holder is 140mm in diameter, suitable for wafers up to 4 inches. It can be heated from room temperature up to 500°C with an accuracy of +/- 1.0 °C.

How is the vacuum level maintained?

It uses a high-speed turbo vacuum pump system coupled with a heavy-duty mechanical pump, achieving a maximum vacuum level of 10^-6 torr with chamber baking.

What gas flow control is available?

The system features two precision digital Mass Flow Controllers (MFC) that allow two types of gases to be filled, with flow rates adjustable via a 6" touch screen panel.

What are the cooling requirements for the sputtering heads?

Water cooling is required for both magnetron sputtering heads. A digitally controlled recirculating water chiller is included to maintain appropriate operating temperatures.